Current Issue
Edited by
André Ricard
LAPLACE, Univ. Toulouse, CNRS, 118 Route de Narbonne 31062 Toulouse, France and LPGP, Univ. Paris-Saclay, CNRS, 91.400 Orsay, France.
ISBN 978-81-973574-1-1 (Print)
ISBN 978-81-973574-0-4 (eBook)
DOI: https://doi.org/10.9734/bpi/mono/978-81-973574-1-1
It is presently reported new results to correct and to modify some parts of previous books Plasmas Afterglows with N2 for Surface Treatments, editions 1-3, published by Bookpi – editions in 2021,2022 and 2023.
In a first chapter, these new results concern the production of plasma active species with N2 which contain dissociated atoms or radicals. They mainly introduce changes of the N+N+M(N2,Ar,He) recombination rates after the H-atoms density recently measured by a Two Photon Laser Induced Fluorescence ( TALIF) diagnostics in the Toulouse Laplace Lab. It follows changes of H and NH densities in the afterglows of N2 and Ar-N2 microwave discharges.
In a second chapter, plasmas maintained by microwave fields were reconsidered from the previous Chapter 8 (Bookpi edition 1 - 2021) showing that they are due to surface waves. Several microwave plasmas sources are described from low pressure Ar plasmas: surfatron and surfaguide cavity up to atmospheric gas pressure Ar plasmas as TIA/TIAGO torches.
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