Ion Irradiation Effect on Structure and Magnetic Properties of Multilayer Fe/Si


ISBN 978-93-5547-189-5 (Print)
ISBN 978-93-5547-197-0 (eBook)
DOI: 10.9734/bpi/mono/978-93-5547-189-5

 

In the last decades, many books have been published on ion irradiation or ion beam processing, due to the advantages of using ion irradiation to modify surfaces of the films and its properties. The aims this volume is to review the special topic related to “ion irradiation effect on the structure and magnetic properties of multilayer Fe/Si”. While it used to be that ion irradiation processes related to simply technique to creation or modify of the film and give a novel phenomenon at the level nanometer scale. Ion beam irradiation are now also used to aggretates metals and semiconductor into nanocluster with a novel properties.

It is pleasure to thank to management of National Agency of Reserach and Innovation (BRIN)-Indonesia for all support until this manscript ready to published. 

 

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Ion Irradiation Effect on Structure and Magnetic Properties of Multilayer Fe/Si

Setyo Purwanto

Ion Irradiation Effect on Structure and Magnetic Properties of Multilayer Fe/Si, 22 February 2022, Page 1-37
https://doi.org/10.9734/bpi/mono/978-93-5547-189-5

This book was written with the hope that readers especially young researcher or student can study how Argon ion irradiation affects multilayer thin film systems, focus in Fe/Si metal-semiconductor systems and is associated with magnetoresistance (MR) properties. This topic is important because it contains an understanding of the phenomena of physical properties which are very important in relation to MR phenomena on the nanometer scale. The thin films with thicknesses in the nanometer scale are made using the Helicon Sputering technique, a technique that allows the production of films with a very high level of precision. Furthermore, with ion irradiation treatment, it can be seen that there is an effect on the MR properties which can be related to the interfacial structure between Fe and Si layers. Several characterization techniques such as Conversion Electron Mossbauer Spectroscopy (CEMS), Rutherford Back Scattering(RBS) can clarify this effect, including X-ray diffraction(XRD) techniques and confirmation with Vibrating Sample Magnetometer(VSM) and Four Point Probe(FPP) for the magnetic and MR properties of post-irradiated thin film systems. This book can complement our understanding that ion irradiation can changed the physical properties of thin films and the performance of using thin films such as magnetic sensors is reduced in sensitivity.

The book is organized into five chapters as follows; in chapter 1 is an introduction about research status of GMR phenomenon in multilayer Fe/Cr and Fe/Si. In chapter 2, we described the basic theory of GMR in multilayer and exchange interaction, also described Helicon plasma Sputtering as synthesis method. Chapter 3, we described about the materials and method of synthesis and characacterization for multilayer film. In Chapter 4, we described in details about pre irradiation and post irradiation of Argon ion related to Fe/Si multilayer and its structure model. In Chapter 5, is the conclusion about ion irradiation effect on structure and magnetic properties of multilayer Fe/Si.