Behaviour of Monolayers Tetraether Lipids Caldarchaeol-PO4 on the Modification of the Solid Surface-supported Wafer Silicon to Amino-silanised: Comparison of Analysis Studies between Langmuir-Blodgett Monolayers with Self-Assembled Monolayers
DOI:
https://doi.org/10.9734/bpi/racms/v6/4301CKeywords:
Caldarchaeol-PO4, Langmuir-Blodgett films, Self Assembling Monolayers (SAMs), Amino-silanised silicon waferAbstract
This study analyzed the behaviour of organization molecular chemically modified tetraether lipids caldarchaeol-PO4 on the modification of the solid surface-supported wafer silicon to amino-silanised using Langmuir-Blodgett films, Self Assembling Monolayers (SAMs), ellipsometry, and atomic force microscopy (AFM). On the silicon wafer with an amino-silaned surface, the monolayers of caldarchaeol-PO4 remained stable. By using the Langmuir-Blodgett technique and SAMs, the organisations of molecular monolayers of caldarchaeol-PO4 have been examined. In the Langmuir-Blodgett procedure, surface pressure is carried out in monolayers of more flat, inhomogeneous caldarchaeol-PO4. A large flat domain is displayed by another way of monolayers caldarchaeol-PO4 using SAMs. Monolayers caldarchaeol-PO4 by the Langmuir-Blodgett method appears to be stable and chemically resistant after washing with organic solvent and an additional treatment ultrasonification with various lipid thicknesses of about 2 nm to 6 nm. Conversely monolayers caldarchaeol-PO4 by SAMs appear less than monolayers caldarchaeol-PO4 by the Langmuir-Blodgett method, thicknesses varying from 1 nm to 3 nm.