The Influence of pH on the Properties of SILAR Deposited Cobalt Selenide Films

Abstract

The successive ionic layer adsorption and reaction method (SILAR) has been used for the growth of various types of thin films. Because of this method has several advantages such as low cost, simple technique, can control film thickness and low temperature production. In this work, binary compound such as cobalt selenide thin films have been produced by using SILAR method under different pH values. The structure, surface morphology and optical properties of the obtained films have been studied by using the X-ray diffraction (XRD), field emission scanning electron microscope (FESEM) and ultraviolet visible spectrophotometer. XRD data indicated a cubic structure. Based on the FESEM analysis, grain size increased when the pH was increased (pH 2 to pH 4). The band gap was found in the range of 2 eV to 2.5 eV.