Improvement in Plasmid Stability of JM109 Host System

Authors

  • Praveen Kumar Vemuri Department of Biotechnology, Koneru Lakshmaiah Education Foundation, Andhra Pradesh, India.
  • Shaik Mohammad Anjum Department of Biotechnology, Koneru Lakshmaiah Education Foundation, Andhra Pradesh, India.
  • Krishna Keerthika Oruganti Department of Biotechnology, Koneru Lakshmaiah Education Foundation, Andhra Pradesh, India.
  • Sarvani Gadiraju Department of Biotechnology, Koneru Lakshmaiah Education Foundation, Andhra Pradesh, India.
  • Yeswanth Sai Kumar Thota Department of Biotechnology, Koneru Lakshmaiah Education Foundation, Andhra Pradesh, India.

DOI:

https://doi.org/10.9734/bpi/rabs/v9/3986A

Keywords:

Plasmid, dantron, acridine orange, radio frequency, microwave, JM109

Abstract

The growth and plasmid stability of the E. coli JM109 host system are described in this paper. Plasmids are important tools for biotechnology, an understanding of the biology of plasmids is highly needed for improved industrial applications. To confirm the colony forming units and the concentration and stability of plasmids, the host system was exposed to a range of medication and chemical concentrations as well as radiation frequencies. Acridine orange, a chemical, had the greatest impact on the growth of DH5a, but dantron, a medicine, had the greatest impact on the growth of the organism. The largest inhibitory effects were observed for microwave radiation at 2GHz and low intensity. Nevertheless, exposure to UV rays had no significant impact on growth. The current study found that drugs, chemicals, radio frequency, and microwave radiation have a significant impact not only on organism growth, but also on the concentration and stability of plasmids.

Published

2022-09-30

How to Cite

Praveen Kumar Vemuri, Shaik Mohammad Anjum, Krishna Keerthika Oruganti, Sarvani Gadiraju, & Yeswanth Sai Kumar Thota. (2022). Improvement in Plasmid Stability of JM109 Host System. Research Aspects in Biological Science Vol. 9, 9–19. https://doi.org/10.9734/bpi/rabs/v9/3986A