A. RICARD; J. P. SARRETTE; S. G. OH; Y. K. KIM. RF and Microwave Afterglows in N2 Gas Mixtures for Surface Nitriding of TiO2 Films. Plasmas afterglows with \(N_2\) for Surface Treatments, [S. l.], p. 92–121, 2021. DOI: 10.9734/bpi/mono/978-93-91595-70-8/CH4. Disponível em: https://stm.bookpi.org/PAWNST/article/view/4915. Acesso em: 29 jul. 2026.