Study of Microwave Afterglows in N2 Gas Mixtures by Emission Spectroscopy and LIF. Application to Surface Cleaning

Authors

  • André Ricard LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 Route de Narbonne, 31062 Toulouse Cedex 9, France.
  • Gérard Baravian LPGP, Universite´ de Paris-Sud, CNRS, 91405 -Orsay, France.
  • Jayr Amorim Departamento de Fisica, Instituto Tecnologico de Aeronautica, Centro Tecnico Aeroespacial, 12228-900 Sao Jose dos Campos, Brazil.
  • Freddy Gaboriau LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 Route de Narbonne, 31062 Toulouse Cedex 9, France.
  • Mireille Gaillard LAPLACE, Université de Toulouse, CNRS, INPT, UPS, 118 Route de Narbonne, 31062 Toulouse Cedex 9, France.

DOI:

https://doi.org/10.9734/bpi/mono/978-93-91595-70-8/CH2

Keywords:

Microwave afterglows, N2 gas mixtures, N, O, H and C atoms density measurements techniques, TALIF, surface cleaning

Abstract

Variations of N, H, O and C-atoms density have been determined along the reduced pressure flowing afterglows of microwave Ar-N2-H2 discharges that have been experimented in Plasmas Labs of Nancy, Montreal, Orsay and Toulouse. The active species density is obtained by NO titration for N and O-atoms and by line intensity ratios for the H and C-atoms. The results obtained by LIF measurements in Orsay and Toulouse Labs are reported for N and H –atoms. The surface cleaning by N and O-atoms has been experimented.

Published

2021-11-17

How to Cite

André Ricard, Gérard Baravian, Jayr Amorim, Freddy Gaboriau, & Mireille Gaillard. (2021). Study of Microwave Afterglows in N2 Gas Mixtures by Emission Spectroscopy and LIF. Application to Surface Cleaning. Plasmas Afterglows With \(N_2\) for Surface Treatments, 32–55. https://doi.org/10.9734/bpi/mono/978-93-91595-70-8/CH2

Issue

Plasmas afterglows with \(N_2\) for Surface Treatments

Section

Contents