A. RICARD; M. CHAKER; M. TABBAL. Effect of the HF Wave Frequency in the N-atom Production in \(N_2\) HF Plasmas: Application to CN Thin Films Deposition. Plasmas Afterglows with \(N_2\) for Surface Treatments - Edition 3, [S. l.], p. 120–137, 2023. DOI: 10.9734/bpi/mono/978-81-19217-08-3/CH27. Disponível em: https://stm.bookpi.org/PAWNST-E3/article/view/10329. Acesso em: 4 jun. 2026.