A. RICARD. N and C-atoms in R (Ar)-\(N_2\)-\(CH_4\) Flowing Afterglows at High Pressure. Plasmas Afterglows with \(N_2\) for Surface Treatments - Edition 3, [S. l.], p. 16–25, 2023. DOI: 10.9734/bpi/mono/978-81-19217-08-3/CH20. Disponível em: https://stm.bookpi.org/PAWNST-E3/article/view/10322. Acesso em: 4 jun. 2026.