N and C-atoms in R (Ar)-\(N_2\)-\(CH_4\) Flowing Afterglows at High Pressure

Authors

  • A. Ricard Université de Toulouse, CNRS, LAPLACE, 118 route de Narbonne, F-31062 Toulouse cedex 9, France.

DOI:

https://doi.org/10.9734/bpi/mono/978-81-19217-08-3/CH20

Keywords:

HF plasmas from 13.6 Mhz to 2450 Mhz;, N N recombination rates in N2 and Ar-2%N2, N and C –atoms; CH3 densities in Ar-N2-CH4

Abstract

The production of N-atom density has been analysed in Ar-N2 high pressure flowing afterglows after HF plasmas at a frequency from 13.6 Mhz to 2450 MHz. The plasma length increased when the HF frequency decreased from 2450 to 13.6 MHz and by lowering x in the Ar-xN2 gas mixture.

It was found that the N+N recombination on the N2(B,v’) states was reduced by 2.5 for v’=11, by 10 for v’=8 and by 30 for v’=0 by going from pure N2 to Ar-2%N2.

The production of N and C-atoms in Ar-N2-xCH4 with x=10-3 – 10-2 showed a drop of N and C-atoms at x=10-2 which should result of N+CH3 reactions. The CH3 and C-atom density was about 4 1011 cm-3 in a Ar-17%N2-1%CH4 gas mixture at 14 Torr.

Published

2023-04-20

How to Cite

A. Ricard. (2023). N and C-atoms in R (Ar)-\(N_2\)-\(CH_4\) Flowing Afterglows at High Pressure. Plasmas Afterglows With \(N_2\) for Surface Treatments - Edition 3, 16–25. https://doi.org/10.9734/bpi/mono/978-81-19217-08-3/CH20