A. RICARD; J. AMORIM. N-atom Density in High Ar-N2 Gas Pressure Microwave Afterglow. Plasmas Afterglows with \(N_2\) for Surface Treatments- Edition 2, [S. l.], p. 185–199, 2022. DOI: 10.9734/bpi/mono/978-93-5547-643-2/CH18. Disponível em: https://stm.bookpi.org/PAWNST-E2/article/view/7879. Acesso em: 29 jul. 2026.