A. RICARD; T. BELMONTE; T. CZERWIEC; S. KONSTANTINIDIS. Remote Plasmas CVD and Reactive Sputtering in Magnetron Plasmas. Plasmas Afterglows with \(N_2\) for Surface Treatments- Edition 2, [S. l.], p. 155–168, 2022. DOI: 10.9734/bpi/mono/978-93-5547-643-2/CH16. Disponível em: https://stm.bookpi.org/PAWNST-E2/article/view/7877. Acesso em: 5 jul. 2026.