A. RICARD; J. AMORIM; M. ABDELADIM; J. P. SARRETTE; Y. K. KIM. N, H and C-atoms Density in Flowing Afterglows of Microwave R/N2-H2 and R/N2-CH4 Discharges with R=N2, He, Ar and Applications to TiO2 Surface Nitriding. Plasmas Afterglows with \(N_2\) for Surface Treatments- Edition 2, [S. l.], p. 61–117, 2022. DOI: 10.9734/bpi/mono/978-93-5547-643-2/CH13. Disponível em: https://stm.bookpi.org/PAWNST-E2/article/view/7874. Acesso em: 5 jul. 2026.