A. Ricard, J. Amorim, M. Abdeladim, J. P. Sarrette, & Y. K. Kim. (2022). N, H and C-atoms Density in Flowing Afterglows of Microwave R/N2-H2 and R/N2-CH4 Discharges with R=N2, He, Ar and Applications to TiO2 Surface Nitriding. Plasmas Afterglows With \(N_2\) for Surface Treatments- Edition 2, 61–117. https://doi.org/10.9734/bpi/mono/978-93-5547-643-2/CH13