Remote Plasmas CVD and Reactive Sputtering in Magnetron Plasmas

Authors

  • A. Ricard LAPLACE, Univ. Toulouse , CNRS , 118 route de Narbonne 31062 Toulouse, France.
  • T. Belmonte Inst. Jean Lamour, Department Physics and Chemistry of Solids and Surfaces, Nançy-Univ. , CNRS , Parc saurupt 54042 Nancy, France.
  • T. Czerwiec Inst. Jean Lamour, Department Physics and Chemistry of Solids and Surfaces, Nançy-Univ. , CNRS , Parc saurupt 54042 Nancy, France.
  • S. Konstantinidis Plasma-surface interaction Chemistry, CIRMAP, Res.Inst.Materials Sc. and Eng. , Univ.of Mons , 25 place du Parc, B-7000 Mons , Belgium.

DOI:

https://doi.org/10.9734/bpi/mono/978-93-5547-643-2/CH16

Keywords:

Ar-O2 reactive plasma, B atoms in microwave CVD, Ce magnetron sputtering, resonant absorption spectroscopy, B atom density, Ce atom density

Abstract

Two optical optical spectroscopy methods have been applied to the determination of B-atoms and Ce-atoms absolute densities. The first one on B-atoms was applied to a remote  microwave plasma.

At the  plasma end, the B-atom density nearly reach , which corresponds to a  dissociation degree of about . It was observed the reactions of -atoms on  desorbing from the tube wall after -atoms collisions.

The second optical spectroscopy is the resonant absorption applied to  - atoms produced in a DC magnetron sputtering of a Ce cathode. In pure Ar plasmas, the Ce density was . By introducing  in the Ar plasma, it was observed an hysteresis effect of Ce density as for the plasma voltage.

Published

2022-07-26

How to Cite

A. Ricard, T. Belmonte, T. Czerwiec, & S. Konstantinidis. (2022). Remote Plasmas CVD and Reactive Sputtering in Magnetron Plasmas. Plasmas Afterglows With \(N_2\) for Surface Treatments- Edition 2, 155–168. https://doi.org/10.9734/bpi/mono/978-93-5547-643-2/CH16

Issue

Plasmas Afterglows with \(N_2\) for Surface Treatments- Edition 2

Section

Contents