André Ricard, Mohammed Chaker and Malek Tabbal. Effect of HF Wave Frequency on N-atom Production in N\(_2\) HF Plasmas and Its Application in CN Thin Films Deposition. PANST [Internet]. 2025 Mar. 26 [cited 2026 Jul. 4];:417-34. Available from: https://stm.bookpi.org/PANST/article/view/17722