Ricard, André. “N and C-Atoms in R (Ar)-N\(_2\)-CH\(_4\) Flowing Afterglows at High Pressure”. Plasmas Afterglows with N2 for Surface Treatments synthesis 2024 (March 26, 2025): 406–416. Accessed July 28, 2026. https://stm.bookpi.org/PANST/article/view/17720.