André Ricard, et al. “N, H and C-Atoms Concentrations in Flowing Afterglows of Microwave R N\(_2\)-H\(_2\) and R N\(_2\)-CH\(_4\) Discharges With R=N\(_2\), He, Ar and Their Applications to TiO\(_2\) Surface Nitriding”. Plasmas Afterglows With N2 for Surface Treatments Synthesis 2024, Mar. 2025, pp. 489-35, doi:10.9734/bpi/mono/978-93-49473-93-5/CH24.