André RICARD; Jayr AMORIM; Moustapha ABDELADIM; Jean-Philippe SARRETTE; Yu-Kwon KIM. N, H and C-atoms Concentrations in Flowing Afterglows of Microwave R/N\(_2\)-H\(_2\) and R/N\(_2\)-CH\(_4\) Discharges with R=N\(_2\), He, Ar and Their Applications to TiO\(_2\) Surface Nitriding. Plasmas Afterglows with N2 for Surface Treatments synthesis 2024, [S. l.], p. 489–535, 2025. DOI: 10.9734/bpi/mono/978-93-49473-93-5/CH24. Disponível em: https://stm.bookpi.org/PANST/article/view/17729. Acesso em: 29 jul. 2026.