André RICARD; Mohammed CHAKER; Malek TABBAL. Effect of HF Wave Frequency on N-atom Production in N\(_2\) HF Plasmas and Its Application in CN Thin Films Deposition. Plasmas Afterglows with N2 for Surface Treatments synthesis 2024, [S. l.], p. 417–434, 2025. DOI: 10.9734/bpi/mono/978-93-49473-93-5/CH21. Disponível em: https://stm.bookpi.org/PANST/article/view/17722. Acesso em: 4 jul. 2026.