André RICARD. N and C-atoms in R (Ar)-N\(_2\)-CH\(_4\) Flowing Afterglows at High Pressure. Plasmas Afterglows with N2 for Surface Treatments synthesis 2024, [S. l.], p. 406–416, 2025. DOI: 10.9734/bpi/mono/978-93-49473-93-5/CH20. Disponível em: https://stm.bookpi.org/PANST/article/view/17720. Acesso em: 29 jul. 2026.