André RICARD; Thierry BELMONTE; Thierry CZERWIEC; Stephanos KONSTANTINIDIS. Remote Plasmas Chemical Vapour Deposition and Reactive Sputtering in Magnetron Plasmas. Plasmas Afterglows with N2 for Surface Treatments synthesis 2024, [S. l.], p. 253–267, 2025. DOI: 10.9734/bpi/mono/978-93-49473-93-5/CH11. Disponível em: https://stm.bookpi.org/PANST/article/view/17711. Acesso em: 29 jul. 2026.