André Ricard et al. 2025. Remote Plasmas Chemical Vapour Deposition and Reactive Sputtering in Magnetron Plasmas. Plasmas Afterglows with N2 for Surface Treatments synthesis 2024. (Mar. 2025), 253–267. DOI:https://doi.org/10.9734/bpi/mono/978-93-49473-93-5/CH11.