The Iron Nitriding in N\(_2\) and N\(_2\)-H\(_2\) Afterglows
DOI:
https://doi.org/10.9734/bpi/mono/978-93-49473-93-5/CH22Keywords:
(Ar)N2-H2 , (Ar)N2-CH4 microwave afterglows, iron nitriding, iron nitrocarburizing, N-atom density, \(\epsilon\), \(\gamma\)' iron layersAbstract
The iron nitriding which allows a hard coating process has been studied in microwave plasma afterglows in Ar-N2, Ar- N2-H2 and Ar-N2-CH4 gas mixtures by optical spectroscopy. The thickness of \(\epsilon\) and \(\gamma\)' layers have been measured by micrography. It is shown that the introduction of H2 and CH4 into N2 removed the native oxide layers and allowed the growth of \(\epsilon\) - layers.
To avoid film damage by the plasma high-energy electrons, remote microwave plasmas have given satisfactory results. An iron nitriding with \(\epsilon\) - layers thickness of 10 \(\mu\)m has been obtained in an industrial scale reactor of 90 liters with Ar-N2-H2 gas mixtures heated at 600oC for 2 hours.
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Published
2025-03-26
How to Cite
Thierry Czerwiec, Thierry Belmonte, & André Ricard. (2025). The Iron Nitriding in N\(_2\) and N\(_2\)-H\(_2\) Afterglows. Plasmas Afterglows With N2 for Surface Treatments Synthesis 2024, 435–450. https://doi.org/10.9734/bpi/mono/978-93-49473-93-5/CH22
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