A. RICARD; J. AMORIM; M. ABDELADIM; J. P. SARRETTE; Y. K. KIM. N, H and C-atoms Density in Flowing Afterglows of Microwave R/N2-H2 and R/N2-CH4 Discharges with R=N2, He, Ar and Applications to TiO2 Surface Nitriding. Current Perspectives on Chemical Sciences Vol. 8, [S. l.], p. 103–143, 2021. DOI: 10.9734/bpi/cpcs/v8/7660D. Disponível em: https://stm.bookpi.org/CPCS-V8/article/view/389. Acesso em: 4 jun. 2026.