A. Ricard, J. Amorim, M. Abdeladim, J. P. Sarrette, & Y. K. Kim. (2021). N, H and C-atoms Density in Flowing Afterglows of Microwave R/N2-H2 and R/N2-CH4 Discharges with R=N2, He, Ar and Applications to TiO2 Surface Nitriding. Current Perspectives on Chemical Sciences Vol. 8, 103–143. https://doi.org/10.9734/bpi/cpcs/v8/7660D